Abstract
In this work, a study is made on the optoelectronic properties of thin MoOX films, with 2 < x < 3. To do this, thin MoOX films were grown with approximate thicknesses of 10, 15 and 20nm by sputtering, which were deposited on glass, and Si-n / p wafers with the aim of subjecting them to different characterization techniques. It is observed that the obtained MoOx films can form a p-n junction if deposited on a Si-n wafer or behave as a hole-extracting layer if deposited on Si-p and the above-mentioned properties shown a substantial improvement after a thermal treatment at 200°C in high vacuum for 30 minutes.
Original language | English |
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Title of host publication | 2019 IEEE 46th Photovoltaic Specialists Conference, PVSC 2019 |
Publisher | Institute of Electrical and Electronics Engineers Inc. |
Pages | 2655-2658 |
Number of pages | 4 |
ISBN (Electronic) | 9781728104942 |
DOIs | |
State | Published - Jun 2019 |
Externally published | Yes |
Event | 46th IEEE Photovoltaic Specialists Conference, PVSC 2019 - Chicago, United States Duration: 16 Jun 2019 → 21 Jun 2019 |
Publication series
Name | Conference Record of the IEEE Photovoltaic Specialists Conference |
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ISSN (Print) | 0160-8371 |
Conference
Conference | 46th IEEE Photovoltaic Specialists Conference, PVSC 2019 |
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Country/Territory | United States |
City | Chicago |
Period | 16/06/19 → 21/06/19 |
Bibliographical note
Funding Information:The authors gratefully acknowledge the projects PAPIIT IN 100717 and IA100219 and CONACyT PN 4797. OdM thanks the support of UNAM/DGAPA/PREI. Program.
Publisher Copyright:
© 2019 IEEE.