Keyphrases
Reflectivity
100%
A-Si
100%
Small Angle X-ray Diffraction
100%
X-ray Diffraction Study
100%
Thermal Stability
100%
Plasma-enhanced Chemical Vapor Deposition (PECVD)
50%
Interface Roughness
50%
Material Mixing
50%
Superlattices
50%
Individual Layer Thickness
50%
Structural Properties
50%
Crystallization
50%
Interface Width
50%
Superlattice
50%
Layer Thickness
50%
Hydrogenated Amorphous Silicon-germanium
50%
Chemical Vapor Deposition Method
50%
Crystallization Process
50%
Heat Treatment
50%
Material Science
X-Ray Diffraction
100%
Superlattice
100%
Reflectivity
100%
Thermal Stability
100%
Germanium
50%
Plasma-Enhanced Chemical Vapor Deposition
50%
Amorphous Silicon
50%
Structural Property
50%
Heat Treatment
50%
Crystallization
50%
Engineering
Ray Diffraction
100%
Layer Thickness
100%
Structural Property
50%
Chemical Vapor Deposition
50%
Hydrogenated Amorphous Silicon
50%
Vapor Deposition
50%
Individual Layer
50%
Heat Treatment
50%
Vapor Deposition Method
50%
Superlattice
50%